Efficient approach to early detection of lithographic hotspots using machine learning systems and pattern matching

TitleEfficient approach to early detection of lithographic hotspots using machine learning systems and pattern matching
Publication TypeConference Paper
Year of Publication2011
AuthorsWuu, J-Y, Pikus, FG, Marek-Sadowska, M, Rieger, ML
Conference NameDesign for Manufacturability through Design-Process Integration V
PublisherSPIE
URLhttp://link.aip.org/link/?PSI/7974/79740U/1
DOI10.1117/12.879546