- Vertical Slit Field Effect Transistor in ultra-low power applications
- Can pin access limit the footprint scaling?
- A Low Energy Network-on-Chip Fabric for 3-D Multi-Core Architectures
- Investigation of emerging middle-of-line poly gate-to-diffusion contact reliability issues
- On Cell Layout-Performance Relationships in VeSFET-Based, High-Density Regular Circuits
- Performance Optimization Using Variable-Latency Design Style
- Twin gate, vertical slit FET (VeSFET) for highly periodic layout and 3D integration
Efficient approach to early detection of lithographic hotspots using machine learning systems and pattern matching
| Title | Efficient approach to early detection of lithographic hotspots using machine learning systems and pattern matching |
| Publication Type | Conference Paper |
| Year of Publication | 2011 |
| Authors | Wuu, J-Y, Pikus, FG, Marek-Sadowska, M, Rieger, ML |
| Conference Name | Design for Manufacturability through Design-Process Integration V |
| Publisher | SPIE |
| URL | http://link.aip.org/link/?PSI/7974/79740U/1 |
| DOI | 10.1117/12.879546 |
