Title | OPC-Free and Minimally Irregular IC Design Style |
Publication Type | Conference Paper |
Year of Publication | 2007 |
Authors | Maly, W, Yi-Wei Lin, Marek-Sadowska, M |
Conference Name | Design Automation Conference, 2007. DAC '07. 44th ACM/IEEE |
Date Published | june |
Keywords | design for manufacture, IC layout, IC manufacturability, integrated circuit layout, integrated circuit manufacture, layout style, OPC-free IC design, proximity effect (lithography), transistors, VLSI |
Abstract | Advancements in IC manufacturing technologies allow for building very large devices with billions of transistors and with complex interactions between them encapsulated in a huge number of design rules. To ease designers' efforts in dealing with electrical and manufacturing problems, regular layout style seems to be a viable option. In this paper we analyze regular layouts in an IC manufacturability context and define their desired properties. We introduce the OPC-free IC design methodology and study properties of cells designed for this layout style that have various degrees of regularity. |